• DocumentCode
    969869
  • Title

    Improved small-signal analysis of the quantum-well injection transit time diode

  • Author

    Botula, Alan ; Wang, K.L.

  • Author_Institution
    Device Res. Lab., California Univ., Los Angeles, CA, USA
  • Volume
    37
  • Issue
    1
  • fYear
    1990
  • fDate
    1/1/1990 12:00:00 AM
  • Firstpage
    58
  • Lastpage
    66
  • Abstract
    Two improved methods for calculating the small-signal impedance of the quantum-well injection transit time diode are discussed. The first extends the traditional analysis to include carrier velocity transient effects, producing an analytical expression from which optimum injection conductance and drift angle can be found. The second method includes the effects of both nonuniform carrier velocity and diffusion, casting the expression for impedance in terms of a double integration that is evaluated numerically. A lumped-element model that closely duplicates the impedance found by the numerical method is developed. A graphical means that allows the generation of the lumped-element model from the DC negative resistance and knowledge of the diode structure is provided. The more sophisticated models developed should be useful in device design, in evaluation of mounting and packaging schemes, and for suppression of unwanted oscillations
  • Keywords
    electric impedance; negative resistance; semiconductor device models; semiconductor diodes; semiconductor quantum wells; solid-state microwave devices; transit time devices; DC negative resistance; analytical expression; carrier velocity transient effects; diffusion; drift angle; graphical means; impedance; lumped-element model; mounting schemes; nonuniform carrier velocity; numerical method; numerically evaluated double integration; optimum injection conductance; packaging schemes; quantum-well injection transit time diode; small-signal impedance; unwanted oscillation suppression; Circuit stability; Diodes; Electron emission; Gallium arsenide; Impedance; Packaging; Quantum wells; Semiconductor process modeling; Transient analysis; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.43801
  • Filename
    43801