DocumentCode
970302
Title
Alternative mechanism for substrate minority carrier injection in MOS devices operating in low level avalanche
Author
Childs, P.A. ; Eccleston, W. ; Stuart, R.A.
Author_Institution
University of Liverpool, Department of Electrical Engineering & Electronics, Liverpool, UK
Volume
17
Issue
8
fYear
1981
Firstpage
281
Lastpage
282
Abstract
The mechanism proposed by Matsunaga et al. to explain the injection of minority carriers into the substrate of a saturated n-channel MOST cannot account for the size of the observed current. An alternative mechanism is suggested based on optical generation of minorities by radiation emitted by hot carriers in the drain depletion region. Evidence for this mechanism is presented.
Keywords
hot carriers; insulated gate field effect transistors; minority carriers; MOS devices; drain depletion region; hot carriers; low level avalanche; n-channel MOST; substrate minority carrier injection;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19810197
Filename
4245664
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