DocumentCode :
970366
Title :
Ohmic contacts on n-GaAs produced by spark alloying
Author :
D´angelo, R. ; Verlangieri, P.A.
Author_Institution :
Bell Laboratories, Crawford Hill Laboratory, Holmdel, USA
Volume :
17
Issue :
8
fYear :
1981
Firstpage :
290
Lastpage :
291
Abstract :
A new method of forming ohmic contacts on n-GaAs using electroplated Sn/Au and alloying with a high frequency spark generator is described. This process gives an average contact resistance of 3.9×10¿6±0.2×10¿6 ¿cm2, which is comparable to results obtained by laser irradiation and indirect electric heating. The sparking technique produces uniform alloying of the substrate surface, while avoiding high temperatures throughout the substrate.
Keywords :
III-V semiconductors; contact resistance; gallium arsenide; gold; ohmic contacts; III-V semiconductor; contact resistance; electroplated Sn/Au; high frequency spark generator; indirect electric heating; laser irradiation; n-GaAs; ohmic contacts; spark alloying;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19810203
Filename :
4245670
Link To Document :
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