Title :
Reduction in dispersion of silica-based AWG using photosensitive phase trimming technique
Author :
Abe, M. ; Takada, K. ; Tanaka, T. ; Itoh, M. ; Kitoh, T. ; Hibino, Y.
Author_Institution :
NTT Photonics Labs., Kanagawa, Japan
fDate :
12/5/2002 12:00:00 AM
Abstract :
The dispersion of a 25 GHz-spaced 64-channel silica-based arrayed waveguide grating (AWG) is reduced using a photosensitive phase trimming technique. The dispersion at the centre wavelength was reduced from about 170 to 30 ps/nm. Furthermore, we confirmed the same improvement in the dispersion for all 64 ports. The trimming technique is useful for realising fine AWGs with low crosstalk and dispersion.
Keywords :
arrayed waveguide gratings; demultiplexing equipment; multiplexing equipment; optical communication equipment; optical crosstalk; optical dispersion; optical fabrication; optical planar waveguides; silicon compounds; 25 GHz-spaced 64-channel silica-based arrayed waveguide grating; SiO2; centre wavelength; demultiplexers; dispersion reduction; fine AWG; low crosstalk; multiplexers; photosensitive phase trimming technique; planar lightwave circuit; silica-based AWG;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20021144