• DocumentCode
    971438
  • Title

    Observation of velocity overshoot in silicon inversion layers

  • Author

    Assaderaghi, Fariborz ; Kop, P.K. ; Hu, Chenming

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • Volume
    14
  • Issue
    10
  • fYear
    1993
  • Firstpage
    484
  • Lastpage
    486
  • Abstract
    Employing a test structure, velocity overshoot in silicon inversion layers is observed at room temperature. For channel lengths longer than 0.3 mu m, the velocity/field relation follows the well-known behavior with no channel length dependence. The first indication of velocity overshoot is seen at a channel length of 0.22 mu m, while at L=0.12 mu m, drift velocities up to 35% larger than the long-channel value are measured.<>
  • Keywords
    carrier mobility; elemental semiconductors; insulated gate field effect transistors; metal-insulator-semiconductor structures; semiconductor-insulator boundaries; silicon; 0.12 to 0.3 micron; SOI structures; Si inversion layers; Si-SiO/sub 2/; channel length dependence; room temperature; test structure; velocity overshoot; velocity/field relation; Electron mobility; Insulation; Length measurement; MOSFETs; Semiconductor films; Silicon; Testing; Threshold voltage; Transconductance; Velocity measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.244738
  • Filename
    244738