DocumentCode :
971557
Title :
Embedded optical interconnections using thin film InGaAs metal-semiconductor-metal photodetectors
Author :
Huang, Z. ; Ueno, Y. ; Kaneko, K. ; Jokerst, N.M. ; Tanahashi, S.
Author_Institution :
Dept. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume :
38
Issue :
25
fYear :
2002
fDate :
12/5/2002 12:00:00 AM
Firstpage :
1708
Lastpage :
1709
Abstract :
The integration of InGaAs photodetectors embedded in a polymer interconnection waveguide on Si and ceramic electrical interconnection substrates has been demonstrated. The photodetector and substrate are independently fabricated and bonded, with subsequent waveguide integration. The embedding fabrication process, coupling, and bandwidth are reported at 1 Gbit/s.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; integrated circuit interconnections; metal-semiconductor-metal structures; optical couplers; optical interconnections; photodetectors; 1 Gbit/s; InGaAs; bandwidth; coupling; electrical interconnection substrates; embedded optical interconnections; fabrication process; interconnect design; metal-semiconductor-metal photodetectors; millihaul interconnections; polymer interconnection waveguide; waveguide integration;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20021047
Filename :
1137479
Link To Document :
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