DocumentCode :
971586
Title :
Distributed-index planar microlens array prepared from deep electromigration
Author :
Oikawa, Masahiro ; Iga, Kenichi ; Sanada, Toshiyuki
Author_Institution :
Tokyo Institute of Technology, Yokohama, Japan
Volume :
17
Issue :
13
fYear :
1981
Firstpage :
452
Lastpage :
454
Abstract :
Monolithic fabrication of a new distributed index planar microlens array by means of a deep electromigration technique in a glass substrate is reported. The array consists of distributed index lenses of 1.2 mm in diameter with 6.8 mm focal length. The focused spot is as small as 16 ¿m for ¿=0.63 ¿m. The coupling efficiency of 60% to a multimode VAD fibre has been obtained.
Keywords :
electromigration; integrated optics; lenses; optical workshop techniques; refractive index; deep electromigration technique; distributed index lenses; distributed index planar microlens array; glass substrate; integrated optics; monolithic fabrication; optical workshop techniques; refractive index;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19810317
Filename :
4245789
Link To Document :
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