DocumentCode
971586
Title
Distributed-index planar microlens array prepared from deep electromigration
Author
Oikawa, Masahiro ; Iga, Kenichi ; Sanada, Toshiyuki
Author_Institution
Tokyo Institute of Technology, Yokohama, Japan
Volume
17
Issue
13
fYear
1981
Firstpage
452
Lastpage
454
Abstract
Monolithic fabrication of a new distributed index planar microlens array by means of a deep electromigration technique in a glass substrate is reported. The array consists of distributed index lenses of 1.2 mm in diameter with 6.8 mm focal length. The focused spot is as small as 16 ¿m for ¿=0.63 ¿m. The coupling efficiency of 60% to a multimode VAD fibre has been obtained.
Keywords
electromigration; integrated optics; lenses; optical workshop techniques; refractive index; deep electromigration technique; distributed index lenses; distributed index planar microlens array; glass substrate; integrated optics; monolithic fabrication; optical workshop techniques; refractive index;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19810317
Filename
4245789
Link To Document