Quantitative evaluation of shape of image on photoresist of square apertures

Author

Mathur, B.P. ; Kundu, N.N. ; Gupta, Shri N.

Author_Institution

Semicond. Devices Area, Central Electron. Eng. Res. Inst., Pilani, India

Volume

35

Issue

3

fYear

1988

fDate

3/1/1988 12:00:00 AM

Firstpage

294

Lastpage

297

Abstract

Simulation of images of two-dimensional structures in optical lithography is considered to have become quite important with the patterning of near-micrometer geometries in complex structures encountered in VLSI. Here, the results are presented of theoretical computations performed to calculate the aerial image of square apertures in a projection system using a partially coherent light source. The resist has been modeled by its sensitivity curve in order to compute the image profile on the resist after development. A figure of merit (FOM) has been proposed that quantifies the shape of the aerial as well as the resist image. Such an FOM has been proposed that can be used very effectively to optimize a lithographic process

Keywords

VLSI; photoresists; picture processing; 2D structures; VLSI; aerial image; figure of merit; image shape evaluation; image simulation; optical lithography; partially coherent light source; patterning; photoresist; projection system; sensitivity curve; square apertures; Apertures; Computational modeling; Geometrical optics; Light sources; Lithography; Optical sensors; Resists; Shape; Solid modeling; Very large scale integration;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/16.2453

Filename

2453