DocumentCode
972628
Title
Room temperature CW operation of GaInAsP/InP double-heterostructure diode lasers emitting at 1.23 ¿m grown by low-pressure metalorganic chemical vapour deposition
Author
Razeghi, M. ; Hirtz, J.P. ; Hirtz, P. ; Larivain, J.P. ; Bondeau, R. ; de Cremoux, B. ; Duchemin, J.P.
Author_Institution
Thomson-CSF, Laboratoire Central de Recherches, Orsay, France
Volume
17
Issue
17
fYear
1981
Firstpage
597
Lastpage
598
Abstract
We report the first successful room-temperature CW operation of GaInAsP/InP DH lasers emitting at 1.23 ¿m grown by LP MOCVD. Current thresholds as low as 250 mA have been obtained for CW operation.
Keywords
III-V semiconductors; gallium arsenide; indium compounds; laser transitions; semiconductor junction lasers; vapour phase epitaxial growth; 1.23 mu m; GaInAsP-InP DH diode laser; III-V semiconductors; current threshold; low-pressure metalorganic chemical vapour deposition;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19810420
Filename
4245896
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