• DocumentCode
    972697
  • Title

    Fast Statistical Analysis of Process Variation Effects Using Accurate PLL Behavioral Models

  • Author

    Chin-Cheng Kuo ; Meng-Jung Lee ; Chien-Nan Liu ; Ching-Ji Huang

  • Author_Institution
    Dept. of Electr. Eng., Nat. Central Univ., Jungli
  • Volume
    56
  • Issue
    6
  • fYear
    2009
  • fDate
    6/1/2009 12:00:00 AM
  • Firstpage
    1160
  • Lastpage
    1172
  • Abstract
    Using the behavioral model of a circuit to perform behavioral Monte Carlo simulation (BMCS) is a fast approach to estimate performance shift under process variation with detailed circuit responses. However, accurate Monte Carlo analysis results are difficult to obtain if the behavioral model is not accurate enough. Therefore, this paper proposes to use an efficient bottom-up approach to generate accurate process-variation-aware behavioral models of CPPLL circuits. Without blind regressions, only one input pattern in the extraction mode sufficiently obtains all required parameters in the behavioral model. A quasi-SA approach is also proposed to accurately reflect process variation effects. Considering generic circuit behaviors, the quasi-SA approach saves considerable simulation time for complicated curve fitting but still keeps estimation accuracy. The experimental results demonstrate that the proposed bottom-up modeling flow and quasi-SA equations provide similar accuracy as in the RSM approach, using less extraction cost as in the traditional sensitivity analysis approach.
  • Keywords
    Monte Carlo methods; circuit simulation; phase locked loops; sensitivity analysis; statistical analysis; voltage-controlled oscillators; Monte Carlo simulation; PLL behavioral models; bottom-up approach; phase-locked loop circuits; process-variation-aware behavioral models; sensitivity analysis; statistical analysis; Analog circuits; Circuit optimization; Circuit simulation; Delay; Digital circuits; Equations; Monte Carlo methods; Phase locked loops; Statistical analysis; Timing; Behavioral model; Monte Carlo simulation; process variation; quasi-SA;
  • fLanguage
    English
  • Journal_Title
    Circuits and Systems I: Regular Papers, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1549-8328
  • Type

    jour

  • DOI
    10.1109/TCSI.2008.2008502
  • Filename
    4663673