DocumentCode
972965
Title
1.5 ¿m room-temperature pulsed operation of GaInAsP/InP double heterostructure grown by LP MOCVD
Author
Razeghi, M. ; Hirtz, P. ; Larivain, J.P. ; Blondeau, R. ; de Cremoux, B. ; Duchemin, J.P.
Author_Institution
Thomson-CSF, Laboratoire Central de Recherches, Orsay, France
Volume
17
Issue
18
fYear
1981
Firstpage
643
Lastpage
644
Abstract
The letter reports the first successful room-temperature pulsed operation of a broad-area contact laser of GaInAsP/InP double heterostructure, grown by LP MOCVD, emitting at 1.5 ¿m. Pulsed thresholds as low as 2.5 kA/cm2 have been obtained for 1.5 ¿m, for an active layer thickness of 0.48 ¿m. This is equal to a current density per micrometre of 5.2 kA cm¿2 ¿m¿1. InxGa1¿xAsyP1¿y, III, III, V, V alloys are of great interest for use in infra-red devices. They can be grown lattice matched on InP over a wide range of compositions. The resulting bandgap (1.35¿0.75 eV) covers a spectral range which contains the region of lowest losses and lowest dispersion in modern optical fibres. This property makes In1¿xGaxASyP1¿y, very attractive as a semiconductor laser and detector material for future fibre communication systems.
Keywords
III-V semiconductors; gallium arsenide; indium compounds; laser transitions; semiconductor growth; semiconductor junction lasers; vapour phase epitaxial growth; GaInAsP/InP double heterostructure; III-V semiconductors; broad-area contact laser; current density; low pressure metal-organic CVD; optical fibres; room-temperature pulsed operation;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19810451
Filename
4245928
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