• DocumentCode
    973760
  • Title

    The effect of field dependent emission on the current-voltage characteristics of a p+-p--p+ Si:Au:B device

  • Author

    Jang, Sheng-Lyang ; Bosman, Gijs

  • Author_Institution
    Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
  • Volume
    37
  • Issue
    1
  • fYear
    1990
  • fDate
    1/1/1990 12:00:00 AM
  • Firstpage
    222
  • Lastpage
    226
  • Abstract
    The current-voltage characteristics of a silicon p+-p --p+ device doped with boron and gold which showed sublinear behavior at moderately high fields are discussed. With the use of low-frequency voltage noise data measured as a function of electric field, it was determined that the sublinear current-voltage characteristics are caused by a decrease in the hole concentration with increasing electric field. This decrease is caused by a field-induced decrease in the hole emission coefficient, which is larger than the associated field induced decrease in the hole capture coefficient
  • Keywords
    boron; carrier mobility; elemental semiconductors; gold; high field effects; semiconductor devices; silicon; Si:Au,B; current-voltage characteristics; electric field; field dependent emission; hole capture coefficient; hole concentration; hole emission coefficient; low-frequency voltage noise data; moderately high fields; p+-p--p+ Si:Au:B device; sublinear current-voltage characteristics; Boron; Current measurement; Current-voltage characteristics; Gold; Hot carriers; Noise measurement; Semiconductor device noise; Silicon; Temperature measurement; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.43819
  • Filename
    43819