DocumentCode
973760
Title
The effect of field dependent emission on the current-voltage characteristics of a p+-p--p+ Si:Au:B device
Author
Jang, Sheng-Lyang ; Bosman, Gijs
Author_Institution
Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
Volume
37
Issue
1
fYear
1990
fDate
1/1/1990 12:00:00 AM
Firstpage
222
Lastpage
226
Abstract
The current-voltage characteristics of a silicon p+-p --p+ device doped with boron and gold which showed sublinear behavior at moderately high fields are discussed. With the use of low-frequency voltage noise data measured as a function of electric field, it was determined that the sublinear current-voltage characteristics are caused by a decrease in the hole concentration with increasing electric field. This decrease is caused by a field-induced decrease in the hole emission coefficient, which is larger than the associated field induced decrease in the hole capture coefficient
Keywords
boron; carrier mobility; elemental semiconductors; gold; high field effects; semiconductor devices; silicon; Si:Au,B; current-voltage characteristics; electric field; field dependent emission; hole capture coefficient; hole concentration; hole emission coefficient; low-frequency voltage noise data; moderately high fields; p+-p--p+ Si:Au:B device; sublinear current-voltage characteristics; Boron; Current measurement; Current-voltage characteristics; Gold; Hot carriers; Noise measurement; Semiconductor device noise; Silicon; Temperature measurement; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.43819
Filename
43819
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