• DocumentCode
    973792
  • Title

    One-dimensional all injection nonquasi-static models for arbitrarily doped quasi-neutral layers in bipolar junction transistors including plasma-induced energy-gap narrowing

  • Author

    Wu, Ben S. ; Lindholm, Fredrik A.

  • Author_Institution
    Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
  • Volume
    37
  • Issue
    1
  • fYear
    1990
  • fDate
    1/1/1990 12:00:00 AM
  • Firstpage
    250
  • Lastpage
    261
  • Abstract
    Nonquasi-static circuit models accounting for carrier propagation delay in quasi-neutral layers are presented for bipolar junction transistors operating at all injection levels. The models are analytically derived from the Shockley equations for low injection and high injection and are empirically fitted for moderate injection. Large majority current flow in the base, which includes the case of low common-emitter current gain, is also taken into account. The models accommodate all doping profiles via a piecewise-exponential fitting scheme. For very high injection, the resulting electron-hole plasma reduces the energy gap, and this effect is also included. In the simulation of transient or frequency responses, the models provide better accuracy than does the conventional Gummel-Poon (GP) model
  • Keywords
    bipolar transistors; doping profiles; energy gap; semiconductor device models; Gummel Poon model; Shockley equations; arbitrarily doped quasi-neutral layers; base large majority current flow; bipolar junction transistors; carrier propagation delay; common-emitter current gain; doping profiles; electron-hole plasma; frequency responses; injection levels; injection nonquasi-static models; piecewise-exponential fitting scheme; plasma-induced energy-gap narrowing; transient responses; Bipolar transistor circuits; Doping profiles; Equations; Frequency; Helium; Impurities; Plasmas; Propagation delay; Quasi-doping; Semiconductor process modeling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.43822
  • Filename
    43822