DocumentCode :
973792
Title :
One-dimensional all injection nonquasi-static models for arbitrarily doped quasi-neutral layers in bipolar junction transistors including plasma-induced energy-gap narrowing
Author :
Wu, Ben S. ; Lindholm, Fredrik A.
Author_Institution :
Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
Volume :
37
Issue :
1
fYear :
1990
fDate :
1/1/1990 12:00:00 AM
Firstpage :
250
Lastpage :
261
Abstract :
Nonquasi-static circuit models accounting for carrier propagation delay in quasi-neutral layers are presented for bipolar junction transistors operating at all injection levels. The models are analytically derived from the Shockley equations for low injection and high injection and are empirically fitted for moderate injection. Large majority current flow in the base, which includes the case of low common-emitter current gain, is also taken into account. The models accommodate all doping profiles via a piecewise-exponential fitting scheme. For very high injection, the resulting electron-hole plasma reduces the energy gap, and this effect is also included. In the simulation of transient or frequency responses, the models provide better accuracy than does the conventional Gummel-Poon (GP) model
Keywords :
bipolar transistors; doping profiles; energy gap; semiconductor device models; Gummel Poon model; Shockley equations; arbitrarily doped quasi-neutral layers; base large majority current flow; bipolar junction transistors; carrier propagation delay; common-emitter current gain; doping profiles; electron-hole plasma; frequency responses; injection levels; injection nonquasi-static models; piecewise-exponential fitting scheme; plasma-induced energy-gap narrowing; transient responses; Bipolar transistor circuits; Doping profiles; Equations; Frequency; Helium; Impurities; Plasmas; Propagation delay; Quasi-doping; Semiconductor process modeling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.43822
Filename :
43822
Link To Document :
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