Title :
The Blocking Capability ot Alloyed Silicon Power Transistors
Author :
Emeis, R. ; Herlet, A.
Author_Institution :
Siemens-Schuckertwerke AG, Pretzfeld ÿber Forchheim, Oberfranken, Germany
fDate :
6/1/1958 12:00:00 AM
Abstract :
An extensive series of silicon n-p-n alloyed transistors has been made. One set of these transistors has base thicknesses of 40-45 ¿; the other, 55-60 ¿. In each group the base resistiv ity is varied from 2 ohm-cm to 7000 ohm-cm. The "blocking capability" of these transistors is plotted against base resistivity. The results are compared with theory. Agreement is good. Details of the current-voltage characteristic are discussed. Three base resistivity regions are distinguished: 1) pure breakdown; 2) approximately simultaneous occurrence of breakdown and punch-through; and 3) pure punch-through.
Keywords :
Conductivity; Electric breakdown; Germanium; Lead; Leakage current; Power transistors; Scattering; Silicon alloys; Uncertainty; Voltage;
Journal_Title :
Proceedings of the IRE
DOI :
10.1109/JRPROC.1958.286906