DocumentCode :
974375
Title :
Design and Fabrication of 4H-SiC RF MOSFETs
Author :
Gudjónsson, Gudjón I. ; Allerstam, Fredrik ; Sveinbjörnsson, Einar Ö ; Hjelmgren, Hans ; Nilsson, Per-Åke ; Andersson, Kristoffer ; Zirath, Herbert ; Rödle, Thomas ; Jos, Rik
Author_Institution :
Chalmers Univ. of Technol., Goteberg
Volume :
54
Issue :
12
fYear :
2007
Firstpage :
3138
Lastpage :
3145
Abstract :
We present simulations, fabrication and analysis of 4H-SiC RF power MOSFETs. We obtain an extrinsic transition frequency of 11.2 GHz and an /max = 11.9 GHz, a breakdown voltage above 200 V and an output power of 1.9 W/mm at 3 GHz. The measured devices are double fingered, source-gate-drain-gate-source with 2times0.4 mm total gate width and the nominal channel length of the devices is 0.5 mum. To the authors knowledge, this is the highest transition frequency and output power density ever reported for SiC RF MOSFETs. The antipunch through is introduced as a way to take advantage of the SiC´s material properties. A detailed description of the device processing is also given.
Keywords :
III-V semiconductors; MOSFET; silicon compounds; wide band gap semiconductors; 4H-SiC RF MOSFET; antipunchthrough; breakdown voltage; device processing; extrinsic transition frequency; output power density; source-gate-drain-gate-source; Doping; Fabrication; Geometry; Interface states; MOSFETs; Power amplifiers; Power generation; Radio frequency; Silicon carbide; Threshold voltage; HF amplifiers; MOSFETs; power MOSFETs; silicon carbide;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.908547
Filename :
4383029
Link To Document :
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