DocumentCode
974473
Title
Erratum: Effect of illumination and gate bias on flat-band voltage in plasma CVD Si-N on n-Si MIS structure
Author
Jeong, M.U. ; Shirafuji, J. ; Inuishi, Y. ; Yakushiji, Hiroshi ; Harada, Kanako ; Oka, Hikaru
Volume
17
Issue
22
fYear
1981
Firstpage
862
Keywords
CVD coatings; electronic conduction in insulating thin films; metal-insulator-semiconductor structures; photovoltaic effects; silicon compounds; capacitance voltage characteristics; electronic conduction in insulating films; flat band voltage; light illumination; model; negative gate bias;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19810600
Filename
4246081
Link To Document