DocumentCode :
976016
Title :
High performance Al0.48In0.52As/Ga0.47In0.53As HFETs
Author :
Dambkes, H. ; Marschall, P.
Author_Institution :
Daimler-Benz AG Res. Inst., Ulm, West Germany
Volume :
26
Issue :
7
fYear :
1990
fDate :
3/29/1990 12:00:00 AM
Firstpage :
488
Lastpage :
490
Abstract :
MBE grown Al0.48In0.52As/Ga0.47In0.53As heterostructure field effect transistors have been fabricated on InP substrates. DC characteristics of 1.3 mu m gate devices show no kink effects and no breakdown, even for drain to gate voltages in excess of -4.5 V, thus demonstrating excellent material properties. High frequency investigations reveal a very low output conductance of about 12 mS/mm and a transconductance in excess of 420 mS/mm. Cutoff frequencies of 75 GHz are achieved for 1.3 mu m gate length. These values are the highest reported for devices of this geometry at room temperature.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; solid-state microwave devices; -4.5 V; 1.3 micron; 75 GHz; Al 0.48In 0.52As-Ga 0.47In 0.53As; DC characteristics; HEMT; HFETs; InP substrates; MBE; heterostructure field effect transistors; low output conductance; models; room temperature; transconductance;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19900317
Filename :
50248
Link To Document :
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