DocumentCode :
976307
Title :
Room temperature CW operation of GaInAsP/InP double heterostructure diode lasers emitting at 1.5 ¿m grown by low pressure metalorganic chemical vapour deposition (LP-MO CVD)
Author :
Razeghi, M. ; Hirtz, P. ; Blondeau, R. ; Larivain, J.P. ; Noel, Laurent ; de Cremoux, B. ; Duchemin, J.P.
Author_Institution :
Thomson-CSF, Etablissement de Corbeville, Orsay, France
Volume :
18
Issue :
3
fYear :
1982
Firstpage :
132
Lastpage :
133
Abstract :
Room temperature continuous wave (CW) operation at 1.5 ¿m has been achieved in GaInAsP/InP DH lasers fabricated on material grown by low-pressure metalorganic chemical vapour deposition (LP-MO CVD). Threshold currents as low as 200 mA DC have been measured for devices with a stripe width of 9 ¿m and a cavity length of 300 ¿m. Values of To as high as 64 K have been obtained, where To is defined by the expression Jth(T) = Jth(0) exp (T/To). Fundamental transverse mode oscillation has been achieved up to an output power of 10 mW.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; laser transitions; semiconductor growth; semiconductor junction lasers; vapour phase epitaxial growth; 1.5 microns; GaInAsP/InP double heterostructure diode lasers; III-V semiconductors; cavity length; low-pressure metalorganic chemical vapour deposition; room temperature CW operation; stripe width; threshold current; transverse mode oscillation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19820088
Filename :
4246264
Link To Document :
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