• DocumentCode
    976520
  • Title

    Dynamics of a collisional, capacitive RF sheath

  • Author

    Lieberman, Michael A.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • Volume
    17
  • Issue
    2
  • fYear
    1989
  • fDate
    4/1/1989 12:00:00 AM
  • Firstpage
    338
  • Lastpage
    341
  • Abstract
    A self-consistent solution for the dynamics of a high-voltage, capacitive RF sheath driven by a sinusoidal current source is obtained, under the assumptions of time-independent, collisional ion motion and inertialess electrons. Values of the ion current density, the sheath capacitance per unit area for the fundamental voltage harmonic, and the conductance per unit area for stochastic heating by the oscillating sheath are calculated. The ratio of the DC to the peak value of the oscillating voltage is found to be 0.40, while the second and third voltage harmonics are, respectively, 19.3% and 5.3% of the fundamental
  • Keywords
    plasma collision processes; plasma sheaths; collisional ion motion; dynamics; fundamental voltage harmonic; high voltage capacitive RF sheath; inertialess electrons; ion current density; plasma sheath; self-consistent solution; sinusoidal current source; stochastic heating; Capacitance; Current density; Electrodes; Electrons; Equations; Permittivity; Plasma density; Plasma sheaths; Radio frequency; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.24645
  • Filename
    24645