DocumentCode
976647
Title
The effect of sheet resistance modifications underneath the contact on the extraction of the contact resistivity: application to the cross Kelvin resistor
Author
Scorzoni, A. ; Finetti, M.
Author_Institution
CNR-Inst. LAMEL, Bologna, Italy
Volume
35
Issue
3
fYear
1988
fDate
3/1/1988 12:00:00 AM
Firstpage
386
Lastpage
388
Abstract
The influence of sheet-resistance modifications underneath the contact on the extraction of the contact resistivity is investigated. A generalized scaling theory has been applied to the modeling of the cross Kelvin resistor. It is shown that the errors associated with the contact sheet resistance modification could become appreciable in low-resistance metallizations of interest in VLSI
Keywords
contact resistance; metallisation; semiconductor device models; semiconductor-metal boundaries; VLSI; contact resistivity; cross Kelvin resistor; low-resistance metallizations; modeling; scaling theory; semiconductor metal boundary; sheet resistance modifications; Analytical models; Conductivity; Contact resistance; Electrical resistance measurement; Kelvin; Metallization; Resistors; Silicides; Testing; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.2466
Filename
2466
Link To Document