Title :
The effect of sheet resistance modifications underneath the contact on the extraction of the contact resistivity: application to the cross Kelvin resistor
Author :
Scorzoni, A. ; Finetti, M.
Author_Institution :
CNR-Inst. LAMEL, Bologna, Italy
fDate :
3/1/1988 12:00:00 AM
Abstract :
The influence of sheet-resistance modifications underneath the contact on the extraction of the contact resistivity is investigated. A generalized scaling theory has been applied to the modeling of the cross Kelvin resistor. It is shown that the errors associated with the contact sheet resistance modification could become appreciable in low-resistance metallizations of interest in VLSI
Keywords :
contact resistance; metallisation; semiconductor device models; semiconductor-metal boundaries; VLSI; contact resistivity; cross Kelvin resistor; low-resistance metallizations; modeling; scaling theory; semiconductor metal boundary; sheet resistance modifications; Analytical models; Conductivity; Contact resistance; Electrical resistance measurement; Kelvin; Metallization; Resistors; Silicides; Testing; Very large scale integration;
Journal_Title :
Electron Devices, IEEE Transactions on
