DocumentCode
976942
Title
The DOFLM Microelectronics Program
Author
Prugh, T.A. ; Nall, J.R. ; Doctor, N.J.
Author_Institution
Diamond Ordnance Fuze Labs., Washington, D.C.
Volume
47
Issue
5
fYear
1959
fDate
5/1/1959 12:00:00 AM
Firstpage
882
Lastpage
894
Abstract
A program on microelectronics (electronic microminiaturization) has been underway for the past two years at the Diamond Ordnance Fuze Laboratories (DOFL). Fourteen-component-part, transistorized binary counters were fabricated on 1/2-inch squares of steatite ceramic, 1/50 inch in thickness; and 5-part NOR´s, on 1/2-inch squares of the same thickness. The techniques that have proved most useful in the program have been 1) photolithographic procedures for the accurate placement at microscopic dimensions of physical masks and electrical insulation, 2) thin film deposition using vacuum, chemical, and screening methods, 3) the use of a conductive adhesive which yields high strength and low resistivity connections, and 4) ultrasonic drilling and air abrasion enabling substrates and devices to be formed to desired sizes and shapes. Concurrent with the physical fabrication, studies were made of detailed circuit design and system applications. Future work will include 1) refinement of the present techniques to achieve inexpensive, reliable circuit wafers capable of mass production by industry, and 2) development of advanced methods more fully utilizing thin film deposition and diffusion techniques.
Keywords
Ceramics; Chemicals; Conductive adhesives; Counting circuits; Dielectrics and electrical insulation; Laboratories; Microelectronics; Microscopy; Sputtering; Vacuum technology;
fLanguage
English
Journal_Title
Proceedings of the IRE
Publisher
ieee
ISSN
0096-8390
Type
jour
DOI
10.1109/JRPROC.1959.287284
Filename
4065750
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