Title :
High-resolution 128 x 96 nitride microdisplay
Author :
Choi, H.W. ; Jeon, C.W. ; Dawson, M.D.
Author_Institution :
Inst. of Photonics, Univ. of Strathclyde, Glasgow, UK
fDate :
5/1/2004 12:00:00 AM
Abstract :
Matrix-addressable arrays of InGaN micro-light-emitting diodes with 128 × 96 pixels and a resolution of 1200 dpi have been fabricated using a novel "sloped sidewall" process. The devices have been fabricated on InGaN blue and green wafers, emitting light at the wavelengths of 468 and 508 nm, respectively. A simple circuit, which enables the display of an arrow pattern with ∼60% of the pixels turned on, was used for device testing. At an injection current of 60 mA, the devices deliver 3.3 (blue) and 2.4 mW (green) of output power, corresponding to a luminance of more than 30 000 Cd/m2. These high-brightness and highly versatile devices are certainly an attractive form of emissive micro-display.
Keywords :
III-V semiconductors; light emitting diodes; microdisplays; semiconductor device manufacture; semiconductor device testing; 2.4 mW; 3.3 mW; 468 nm; 508 nm; 60 mA; InGaN; blue wafers; device testing; emitting light; green wafer; injection current; light-emitting diode; luminance; matrix-addressable arrays; micro-light-emitting diodes; nitride microdisplay; sloped sidewall process; Circuit testing; Displays; Electrodes; Gallium nitride; Light emitting diodes; Microdisplays; Organic light emitting diodes; Planarization; Power generation; Quantum well devices;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2004.826541