• DocumentCode
    977185
  • Title

    Silicon carbide on insulator formation using the Smart Cut process

  • Author

    Di Cioccio, L. ; Le Tiec, Y. ; Letertre, F. ; Jaussaud, C. ; Bruel, M.

  • Author_Institution
    Departement de Microtechnol., LETI-CEA, Grenoble, France
  • Volume
    32
  • Issue
    12
  • fYear
    1996
  • fDate
    6/6/1996 12:00:00 AM
  • Firstpage
    1144
  • Lastpage
    1145
  • Abstract
    The Smart Cut process has been applied for the first time to SiC, in order to form silicon carbide on insulator (SiCOI) structures. These structures have been formed on polycrystalline SiC and on silicon substrates
  • Keywords
    annealing; integrated circuit technology; ion implantation; polishing; silicon compounds; wafer bonding; Si; Si substrate; SiC; SiC on insulator formation; SiCOI structures; Smart Cut process; polycrystalline SiC substrate;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19960717
  • Filename
    502907