DocumentCode :
977306
Title :
Boron-doped glass-coated Mo-Si interaction
Author :
Singh, Ashutosh ; Singh, Awatar
Author_Institution :
Dipartimento di Fisica Dell Universita, Modena, Italy
Volume :
74
Issue :
1
fYear :
1986
Firstpage :
224
Lastpage :
225
Abstract :
This letter gives the first report of molybdenum silicide formation by interaction of 1000-Å-thick sputtered molybdenum film and an N-Si
Keywords :
Annealing; Conductivity; Electrical resistance measurement; Etching; Furnaces; Glass; Nitrogen; Silicides; Silicon; Thickness measurement;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1986.13440
Filename :
1457708
Link To Document :
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