DocumentCode :
977811
Title :
Liquid phase epitaxy of a new semiconductor AlGaInSb
Author :
Lendvay, E.
Author_Institution :
Hungarian Academy of Sciences, Research Institute for Technical Physics, Budapest, Hungary
Volume :
18
Issue :
10
fYear :
1982
Firstpage :
407
Lastpage :
408
Abstract :
A new semiconductor system in the quaternary group, AlxGayIn1¿x¿ySb has been prepared. The growth of bulk materials is very difficult because of the reactivity of Al and the segregation effects, but LPE methods were successfully applied to grow homogeneous and good-quality epitaxial layers onto InSb and GaSb.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; indium antimonide; liquid phase epitaxial growth; semiconductor epitaxial layers; semiconductor growth; III-V semiconductor; LPE methods; quaternary group; semiconductor AlGaInSb; semiconductor materials;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19820279
Filename :
4246413
Link To Document :
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