Title :
Some properties of Nb-Nb2O5-Pb(In) Josephson tunnel junctions for devices applications
Author :
Villegier, J.C. ; Matheron, G.
Author_Institution :
Commissariat à ĺEnergie Atomique, Grenoble France
fDate :
1/1/1981 12:00:00 AM
Abstract :
A detailed investigation of tunneling has been carried out on Nb-Nb2O5-Pb(In) junctions where the tunnel barrier is made-of Nb2O5thermal oxide with accurately controlled oxidation parameters. The oxide barrier appears as a n-type semiconductor with two Schottky barriers at the interfaces. The transport of charged oxygen vacancies is supposed to play a fundamental role in the oxidation process. The barrier potential φ and the tunnel resistance R have been related to the oxidation parameters. The junctions realized have sizes ranging from 4 to 104μm2, the Josephson current density, dependent on the oxide thickness, is in the 1-105A/cm2range. Very low transition times from the superconductive to the normal state have been observed.
Keywords :
Josephson devices; Dielectric constant; Electrical resistance measurement; Josephson effect; Kinetic theory; Niobium; Oxidation; Radio frequency; Shape measurement; Tunneling; Voltage;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1981.1060896