Title :
Temperature-Dependent Characteristics of Cylindrical Gate-All-Around Twin Silicon Nanowire MOSFETs (TSNWFETs)
Author :
Cho, Keun Hwi ; Suk, Sung Dae ; Yeoh, Yun Young ; Li, Ming ; Yeo, Kyoung Hwan ; Kim, Dong-Won ; Park, Donggun ; Lee, Won-Seong ; Jung, Young Chai ; Hong, Byung Hak ; Hwang, Sung Woo
Author_Institution :
Res. & Dev. Center, Yongin
Abstract :
The characteristics of cylindrical gate-all-around twin silicon nanowire field-effect transistors with a radius of 5 nm have been measured in temperatures T ranging from 4 to 300 K. The dependence of the off-current suggests that thermal generation in the channel is the main leakage mechanism. The dependence of the subthreshold swing exhibits no body effects but shows degradations due to slight differences in the threshold voltages and in the body effect constants of the twin nanowires. The T dependence of the peak normalized transconductance gm /VDS gives a clue of 1-D phonon scattering and suggests that surface roughness scattering at the nanowire wall is dominant at low values.
Keywords :
MOSFET; leakage currents; nanowires; silicon; surface roughness; 1D phonon scattering; TSNWFET; body effect constants; cylindrical gate-all-around twin silicon nanowire MOSFET; leakage mechanism; normalized transconductance; subthreshold swing; surface roughness scattering; temperature 4 K to 300 K; temperature dependent characteristics; thermal generation; Character generation; FETs; MOSFETs; Scattering; Silicon; Temperature dependence; Temperature distribution; Temperature measurement; Thermal degradation; Threshold voltage; Gate-all-around (GAA); nanowire; temperature;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2007.909868