DocumentCode :
977996
Title :
Amorphous silicon TFT capacitance model using an effective temperature approach
Author :
Kuo, J.B. ; Chen, S.S.
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
29
Issue :
24
fYear :
1993
Firstpage :
2151
Lastpage :
2152
Abstract :
An analytical capacitance model for a-Si:H thin film transistors, that considers deep and tail states simultaneously, is presented. Using an effective temperature approach and a charge-oriented concept, the localised deep and tail states have been considered in the capacitance model. As verified by the published data, this analytical capacitance model provides an accurate prediction of the C-V characteristics of an a-Si:H thin film transistor.
Keywords :
amorphous semiconductors; capacitance; deep levels; elemental semiconductors; equivalent circuits; hydrogen; insulated gate field effect transistors; semiconductor device models; silicon; thin film transistors; C-V characteristics; Si:H; TFT capacitance model; a-Si:H; charge-oriented concept; deep states; effective temperature approach; tail states; thin film transistors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19931438
Filename :
247628
Link To Document :
بازگشت