Title :
A Novel Latch-Up Protection for Bulk-Silicon Scan Driver ICs of Shadow-Mask Plasma-Display Panel
Author :
Sun, Weifeng ; Yi, Yangbo ; Li, Haisong ; Shi, Longxing
Author_Institution :
Southeast Univ., Nanjing
Abstract :
This letter reports a low-cost and excellent latch-up protection technology for bulk-silicon scan driver ICs of shadow-mask plasma-display panel (SM-PDP) by integrating a 100-V lateral double-diffused (LD) MOS and a standard low-voltage (LV)-CMOS control circuit. The technology is implemented using an N+ guard ring in the LV-n-well, a P+ guard ring in the p-substrate near the LV-nMOS, and a deep high-voltage (HV)-n-well and a p-drift guard ring between the HV-nLDMOS and LV-CMOS circuits. The experiment results show that the latch-up in the LV-CMOS circuits is avoided when the scan ICs are applied with -340 V during the sustain periods.
Keywords :
CMOS integrated circuits; driver circuits; plasma displays; silicon; LV-n-well; N+ guard ring; P+ guard ring; bulk-silicon scan driver IC; deep high-voltage-n-well; latch-up protection; lateral double-diffused MOS; low voltage-nMOS; low-voltage-CMOS control circuit; p-drift guard ring; shadow-mask plasma-display panel; voltage -340 V; voltage 100 V; Biomedical electrodes; Costs; Driver circuits; Helium; Medical simulation; Plasmas; Power integrated circuits; Protection; Sun; Voltage; Guard ring; latch-up; lateral double-diffused (LD) MOS; scan driver ICs; shadow-mask plasma-display panel (SM-PDP);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2007.909610