Title :
Fault and error models for VLSI
Author :
Abraham, Jacob A. ; Fuchs, W. Kent
Author_Institution :
University of Illinois, Urbana, IL, USA
fDate :
5/1/1986 12:00:00 AM
Abstract :
This paper describes a variety of fault and error models which are used as the basis for designing fault-tolerant Very Large Scale Integrated (VLSI) systems. The fault models describe physical defects and failures and the input patterns which will expose them, and are suitable for testing, while error models describe the effects on the functional outputs of defects and are useful for on-line error detection. The models are described at various levels of abstraction. The differences between fault and error models for identical functional modules are also illustrated.
Keywords :
Circuit faults; Costs; Electromigration; Error correction; Fault detection; Fault tolerant systems; Manufacturing; Semiconductor device manufacture; System testing; Very large scale integration;
Journal_Title :
Proceedings of the IEEE
DOI :
10.1109/PROC.1986.13528