DocumentCode :
979564
Title :
Field Effect on Silicon Transistors
Author :
Schwartz, B. ; Levy, M.
Author_Institution :
Semiconductor Div., Hughes Products, Newport Beach, Calif.
Volume :
48
Issue :
3
fYear :
1960
fDate :
3/1/1960 12:00:00 AM
Firstpage :
317
Lastpage :
320
Abstract :
A field effect has been observed on an operating silicon transistor. The results have been interpreted as being due to changes in surface recombination velocity produced by changes in surface potential. Using this approach, it was possible to calculate the surface recombination velocity of the base region of an operating device directly, without having to go to a filament measuring technique and then extrapolating back to the device. Relaxation phenomena have also been observed which can be interpreted as being due to a transfer of charge between the fast and the slow states at the surface. Time constants for this transition have been calculated.
Keywords :
Conductivity measurement; Electrodes; Electrostatics; FETs; Germanium; P-n junctions; Pulse modulation; Radiative recombination; Semiconductor materials; Silicon;
fLanguage :
English
Journal_Title :
Proceedings of the IRE
Publisher :
ieee
ISSN :
0096-8390
Type :
jour
DOI :
10.1109/JRPROC.1960.287601
Filename :
4066020
Link To Document :
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