DocumentCode
979849
Title
Future trends in wafer scale integration
Author
Carlson, Richard O. ; Neugebauer, Constantine A.
Author_Institution
General Electric Company, Schenectady, NY, USA
Volume
74
Issue
12
fYear
1986
Firstpage
1741
Lastpage
1752
Abstract
The dramatic increase in the functional density of VLSI has been achieved without greatly increasing the chip size. In wafer scale integration, the area of an entire wafer is made available to increase the functional density still further. However, the requirement for fault tolerance, additional levels of metallization, excess power dissipation, process conservatism to achieve finite yield, and nonoptimum nature of the AI/SiO2 transmission line for cross-wafer communication have made WSI noncompetitive with state-of-the-art VLSI and dense multichip hybrid packaging approaches, at least so far. On the other hand, the potential benefits of WSI are great. Chief among them is the greatly increased expected reliability, which is partly due to an all-monolithic system and partly because of the hope that fault tolerance, which is an absolute requirement for WSI fabrication, can be extended to failure tolerance, and thus the ability to reconfigure during systems operation, and perhaps even transparent to it. Pipeline- or bus-oriented logic structures were found to be the most promising for WSI implementation.
Keywords
Artificial intelligence; Fabrication; Fault tolerance; Fault tolerant systems; Metallization; Packaging; Power dissipation; Power transmission lines; Very large scale integration; Wafer scale integration;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/PROC.1986.13689
Filename
1457957
Link To Document