• DocumentCode
    979849
  • Title

    Future trends in wafer scale integration

  • Author

    Carlson, Richard O. ; Neugebauer, Constantine A.

  • Author_Institution
    General Electric Company, Schenectady, NY, USA
  • Volume
    74
  • Issue
    12
  • fYear
    1986
  • Firstpage
    1741
  • Lastpage
    1752
  • Abstract
    The dramatic increase in the functional density of VLSI has been achieved without greatly increasing the chip size. In wafer scale integration, the area of an entire wafer is made available to increase the functional density still further. However, the requirement for fault tolerance, additional levels of metallization, excess power dissipation, process conservatism to achieve finite yield, and nonoptimum nature of the AI/SiO2transmission line for cross-wafer communication have made WSI noncompetitive with state-of-the-art VLSI and dense multichip hybrid packaging approaches, at least so far. On the other hand, the potential benefits of WSI are great. Chief among them is the greatly increased expected reliability, which is partly due to an all-monolithic system and partly because of the hope that fault tolerance, which is an absolute requirement for WSI fabrication, can be extended to failure tolerance, and thus the ability to reconfigure during systems operation, and perhaps even transparent to it. Pipeline- or bus-oriented logic structures were found to be the most promising for WSI implementation.
  • Keywords
    Artificial intelligence; Fabrication; Fault tolerance; Fault tolerant systems; Metallization; Packaging; Power dissipation; Power transmission lines; Very large scale integration; Wafer scale integration;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/PROC.1986.13689
  • Filename
    1457957