DocumentCode
980887
Title
High-quality InP surface corrugations for 1.55 ¿m InGaAsP DFB lasers fabricated using electron-beam lithography
Author
Westbrook, L.D. ; Nelson, A.W. ; Dix, C.
Author_Institution
British Telecom Research Laboratories, Ipswich, UK
Volume
18
Issue
20
fYear
1982
Firstpage
863
Lastpage
865
Abstract
Second-order surface corrugations for 1.55 ¿m distributed feedback (DFB) lasers have been fabricated in InP with a high yield using electron beam exposed resist masks. Attractive features of this technique are its flexibility and variable mark/space ratio (for optimum DFB coupling strength). Diffraction experiments show these gratings to be of suitably high optical quality.
Keywords
III-V semiconductors; diffraction gratings; electron beam lithography; gallium arsenide; laser accessories; semiconductor junction lasers; 1.55 micron laser; InGaAsP DFB lasers; InP surface corrugations; diffraction gratings; electron-beam lithography; fabrication; optical fibre communication lasers; second order surface corrugations; semiconductor junction lasers; variable mark/space ratio;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19820586
Filename
4246921
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