Title :
Fabrication of curved structures by electron-beam lithography
Author_Institution :
British Telecom Research Laboratories, Ipswich, UK
Abstract :
The suitability of electron-beam lithography for the fabrication of curved structures, of interest for integrated optical devices, can be limited by the available pattern data formats. Extensions to the input format of a Cambridge Instruments electron-beam microfabricator are reported, which have allowed complex patterns to be easily specified for both mask making and direct writing.
Keywords :
electron beam lithography; integrated optics; optical waveguides; Cambridge Instruments; complex patterns; direct writing; electron-beam lithography; electron-beam microfabricator; fabrication of curved structures; integrated optical devices; mask making; optical waveguides fabrication; pattern formats extensions;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19820587
