• DocumentCode
    980897
  • Title

    Fabrication of curved structures by electron-beam lithography

  • Author

    Flavin, P.G.

  • Author_Institution
    British Telecom Research Laboratories, Ipswich, UK
  • Volume
    18
  • Issue
    20
  • fYear
    1982
  • Firstpage
    865
  • Lastpage
    867
  • Abstract
    The suitability of electron-beam lithography for the fabrication of curved structures, of interest for integrated optical devices, can be limited by the available pattern data formats. Extensions to the input format of a Cambridge Instruments electron-beam microfabricator are reported, which have allowed complex patterns to be easily specified for both mask making and direct writing.
  • Keywords
    electron beam lithography; integrated optics; optical waveguides; Cambridge Instruments; complex patterns; direct writing; electron-beam lithography; electron-beam microfabricator; fabrication of curved structures; integrated optical devices; mask making; optical waveguides fabrication; pattern formats extensions;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19820587
  • Filename
    4246922
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=980897