Title :
Experimental Investigation of RF Noise Performance Improvement in Graded-Channel MOSFETs
Author :
Emam, Mostafa ; Sakalas, Paulius ; Vanhoenacker-Janvier, Danielle ; Raskin, Jean-Pierre ; Lim, Tao Chuan ; Danneville, François
Author_Institution :
Microwave Lab., Univ. Catholique de Louvain, Louvain-la-Neuve
fDate :
7/1/2009 12:00:00 AM
Abstract :
In this paper, measured RF noise performance of graded-channel metal-oxide-semiconductor (MOS) transistors (GCMOS - also named laterally asymmetric channel transistors) shows impressive reduction in minimum noise figure (NF min) as compared to classical MOSFET transistors (with the same gate length Lg = 0.5 mum). The reason is proven to be because of the higher noise correlation coefficient (C). GCMOS also shows lower sensitivity to extrinsic thermal noise as compared to classical MOSFET. Moreover, it is demonstrated that the use of 0.5- mum-gate-length GCMOS gives a competitive RF noise performance as compared to 0.25-mum-gate-length classical nMOS transistors.
Keywords :
MOSFET; semiconductor device measurement; semiconductor device noise; thermal noise; RF noise performance; correlation coefficient; graded-channel MOSFET; graded-channel metal-oxide-semiconductor transistor; laterally asymmetric channel transistor; nMOS transistor; size 0.5 mum; thermal noise; transition frequency; Cutoff frequency; FETs; Laboratories; Length measurement; MOSFETs; Noise figure; Noise measurement; Radio frequency; Semiconductor device noise; Transconductance; Graded-channel metal–oxide–semiconductor (GCMOS); minimum noise figure; noise correlation coefficient; silicon-on-insulator (SOI); transition frequency $(f_{T})$;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2009.2021361