• DocumentCode
    981133
  • Title

    Novel technique of nickel disilicide formation

  • Author

    Singh, Awatar ; Khokle, W.S. ; Khokle, W.S.

  • Author_Institution
    CEERI, Pilani, Rajasthan, India
  • Volume
    75
  • Issue
    6
  • fYear
    1987
  • fDate
    6/1/1987 12:00:00 AM
  • Firstpage
    852
  • Lastpage
    853
  • Abstract
    This letter gives the first report of a novel technique of nickel disilicide formation by interaction of 1500 Å thick resistively heated tungsten filament evaporated nickel film with P-Si
  • Keywords
    Annealing; Chemicals; Conductivity; Grain size; Impurities; Insulation; Nickel; Polyimides; Tungsten; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/PROC.1987.13811
  • Filename
    1458078
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=981133