DocumentCode
982889
Title
Performance of
-Type InSb and InAs Nanowire Field-Effect Transistors
Author
Khayer, M. Abul ; Lake, Roger K.
Author_Institution
Dept. of Electr. Eng., Univ. of California, Riverside, CA
Volume
55
Issue
11
fYear
2008
Firstpage
2939
Lastpage
2945
Abstract
The electronic structure of highly scaled InSb and InAs nanowire (NW) field-effect transistors (FETs) is calculated with an eight-band kmiddotp model. Cross sections of 4 nm or less result in bandgaps of 0.8 eV or more. For these cross sections, all devices are single moded and operate in the quantum capacitance limit. Analytical expressions for the transconductance, cutoff frequency, and gate delay time are presented and compared to numerical results. The dependence of the intrinsic cutoff frequency on drive current is weak, scaling as radic{ID} with values in the 4-7 THz range that are good for RF applications. The gate delay times strongly depend on the drive current, scaling as ID -3/2 with values ranging from 25 to 132 fs which are competitive for digital applications.
Keywords
III-V semiconductors; capacitance; energy gap; field effect transistors; indium compounds; k.p calculations; nanowires; semiconductor device models; semiconductor quantum wires; FET; InAs; InSb; NWFET; bandgap; cutoff frequency; drive current; eight-band kmiddotp model; electronic structure; frequency 4 THz to 7 THz; gate delay time; n-type nanowire field effect transistor; quantum capacitance limit; transconductance; Contact resistance; Delay; Differential equations; Effective mass; Electron mobility; FETs; Indium phosphide; Photonic band gap; Radio frequency; Semiconductor materials; ${bf k} cdot {bf p}$ method; Bandstructure; InAs nanowire field-effect transistors (NWFETs); InSb NWFETs; NWs; effective mass;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2008.2005173
Filename
4668580
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