DocumentCode
983522
Title
The spreading resistance error in the vertical Kelvin test resistor structure for the specific contact resistivity
Author
Lee, Chung Len ; Yang, Wen Luh ; Lei, Tan Fu
Author_Institution
Inst. of Electron., Nat. Chiao Tung Univ., Hsin Chu, Taiwan
Volume
35
Issue
4
fYear
1988
fDate
4/1/1988 12:00:00 AM
Firstpage
521
Lastpage
523
Abstract
The spreading resistance error in the vertical Kelvin test resistor (VTR) structure is studied based on an analytic approach. It is found that it is always less than the error existing in the horizontal test structures and can be expressed as the product of the sheet resistance and the square of the junction depth of the conductor resistor divided by a factor approximately equal to 2
Keywords
ohmic contacts; semiconductor device models; semiconductor-metal boundaries; analytic approach; conductor resistor; model; sheet resistance; specific contact resistivity; spreading resistance error; square of junction depth; vertical Kelvin test resistor structure; Conductivity; Contact resistance; Doping; Electrical resistance measurement; Kelvin; Resistors; Silicon; Testing; Video recording; Voltage measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.2489
Filename
2489
Link To Document