DocumentCode
984151
Title
Interface microstructure evolution of lead-free solder on Ni-based under bump metallizations during reflow and high temperature storage
Author
Tung, Chih Hang ; Teo, Poi Siong ; Lee, Charles
Author_Institution
Inst. of Microelectron., Singapore, Singapore
Volume
5
Issue
2
fYear
2005
fDate
6/1/2005 12:00:00 AM
Firstpage
212
Lastpage
216
Abstract
The interface microstructure interaction between SnCuAg Pb-free solder and three different Ni-based alloys under bump metallization (UBM) systems are studied using transmission electron microscopy (TEM). Ni reacts with Sn-rich Pb-free solder swiftly and is consumed readily by Pb-free solder. Thermally stable intermetallic compounds at the solder/UBM interface such as Cu6Sn5 or Ni3P are necessary to protect Ni from being penetrated by Pb-free solders. Interface microstructure study reveals the potential process and reliability issues when applying Pb-free solders on existing UBM systems. Cu/Ni(V)/Al, can be used for Pb-free solder with marginal thermal budget. Au/Ni(V)/Ti/Al, is not suitable for Pb-free solder. And Au/eNi(P)/Al, is the most suitable for Pb-free solder and shows best thermal stability.
Keywords
electronics packaging; interface phenomena; metallisation; nickel alloys; reliability; thermal stability; transmission electron microscopy; Cu-Ni(V)-Al; SnCuAg; high temperature storage; interface microstructure evolution; intermetallic compounds; lead free solder; packaging; solder reflow; thermal stability; transmission electron microscopy; under bump metallizations; Environmentally friendly manufacturing techniques; Gold; Intermetallic; Lead; Metallization; Microstructure; Protection; Temperature; Tin; Transmission electron microscopy; Intermetallic; lead-free solder; packaging; reliability; transmission electron microscopy (TEM); under bump metallization (UBM);
fLanguage
English
Journal_Title
Device and Materials Reliability, IEEE Transactions on
Publisher
ieee
ISSN
1530-4388
Type
jour
DOI
10.1109/TDMR.2005.846978
Filename
1458736
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