• DocumentCode
    984346
  • Title

    Process, design and characterization of ion implanted bubble devices

  • Author

    Jouve, H. ; Magnin, J. ; Hervy, P. ; Mattenet, P.

  • Author_Institution
    Leti, Commissariat à l´´Energie Atomique, Grenoble, France
  • Volume
    17
  • Issue
    6
  • fYear
    1981
  • fDate
    11/1/1981 12:00:00 AM
  • Firstpage
    2914
  • Lastpage
    2916
  • Abstract
    The material characteristics, processing technology, implantation conditions and circuit design are described for a bubble memory chip using ion implantation in order to define the propagation level. Nucleation, transfer between loops and stretching for detection use hairpin conductors. A passive merge is designed in the major loop by taking advantage of the magnetocrystalline anisotropy of the garnet film. At 35 oe of drive field, a minimum of 10 oe operating margins is obtained for all these different functions. The thin Fe-Ni detector has a 1 mV/mA sensitivity with a low noise level.
  • Keywords
    Ion implantation; Magnetic bubble device fabrication; Anisotropic magnetoresistance; Circuit synthesis; Conducting materials; Detectors; Garnet films; Ion implantation; Magnetic anisotropy; Noise level; Perpendicular magnetic anisotropy; Process design;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1981.1061493
  • Filename
    1061493