DocumentCode
984346
Title
Process, design and characterization of ion implanted bubble devices
Author
Jouve, H. ; Magnin, J. ; Hervy, P. ; Mattenet, P.
Author_Institution
Leti, Commissariat à l´´Energie Atomique, Grenoble, France
Volume
17
Issue
6
fYear
1981
fDate
11/1/1981 12:00:00 AM
Firstpage
2914
Lastpage
2916
Abstract
The material characteristics, processing technology, implantation conditions and circuit design are described for a bubble memory chip using ion implantation in order to define the propagation level. Nucleation, transfer between loops and stretching for detection use hairpin conductors. A passive merge is designed in the major loop by taking advantage of the magnetocrystalline anisotropy of the garnet film. At 35 oe of drive field, a minimum of 10 oe operating margins is obtained for all these different functions. The thin Fe-Ni detector has a 1 mV/mA sensitivity with a low noise level.
Keywords
Ion implantation; Magnetic bubble device fabrication; Anisotropic magnetoresistance; Circuit synthesis; Conducting materials; Detectors; Garnet films; Ion implantation; Magnetic anisotropy; Noise level; Perpendicular magnetic anisotropy; Process design;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1981.1061493
Filename
1061493
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