Title :
Breakdown-speed considerations in InP/InGaAs single- and double-heterostructure bipolar transistors
Author :
Chau, Hin-Fai ; Pavlidis, Dimitris ; Hu, Juntao ; Tomizawa, Kazutaka
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
fDate :
1/1/1993 12:00:00 AM
Abstract :
The breakdown and speed characteristics of InP/InGaAs single and double HBTs are presented. Temperature-dependent two- and three-terminal measurements suggest that avalanche impact ionization is the dominant breakdown mechanism in InGaAs collector HBTs. Monte Carlo techniques and 1D drift-diffusion modeling are used for speed and breakdown simulation, respectively. Special doping profiles are evaluated for improving the breakdown-speed characteristics of single HBTs (SHBTs) with conventional uniformly doped InGaAs collectors. Double HBTs (DHBTs) outperform all SHBTs in terms of speed-breakdown tradeoffs as long as they use graded base-collector junctions or they operate under sufficiently high collector-emitter voltage conditions. A cutoff frequency of 200 GHz was found to be feasible with graded DHBTs, and breakdown voltages up to 4.6 V were evaluated with a 3000-Å-thick collector. Nongraded DHBTs can be optimized to perform better in terms of speed-breakdown tradeoffs provided that a high collector doping is used
Keywords :
III-V semiconductors; Monte Carlo methods; doping profiles; gallium arsenide; heterojunction bipolar transistors; impact ionisation; indium compounds; semiconductor device models; 1D drift-diffusion modeling; 200 GHz; 3000 Å; 4.6 V; DHBTs; HBTs; InP-InGaAs; Monte Carlo techniques; SHBTs; avalanche impact ionization; breakdown-speed characteristics; collector-emitter voltage; cutoff frequency; doping profiles; double-heterostructure bipolar transistors; graded base-collector junctions; speed-breakdown tradeoffs; three-terminal measurements; two-terminal measurements; Avalanche breakdown; Doping profiles; Double heterojunction bipolar transistors; Electric breakdown; Impact ionization; Indium gallium arsenide; Indium phosphide; Monte Carlo methods; Semiconductor process modeling; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on