Title :
Diamond FET using high-quality polycrystalline diamond with fT of 45 GHz and fmax of 120 GHz
Author :
Ueda, K. ; Kasu, M. ; Yamauchi, Y. ; Makimoto, T. ; Schwitters, M. ; Twitchen, D.J. ; Scarsbrook, G.A. ; Coe, S.E.
Author_Institution :
NTT Basic Res. Labs., Atsugi, Japan
fDate :
7/1/2006 12:00:00 AM
Abstract :
Using high-quality polycrystalline chemical-vapor-deposited diamond films with large grains (/spl sim/100 μm), field effect transistors (FETs) with gate lengths of 0.1 μm were fabricated. From the RF characteristics, the maximum transition frequency fT and the maximum frequency of oscillation fmax were /spl sim/ 45 and /spl sim/ 120 GHz, respectively. The fT and fmax values are much higher than the highest values for single-crystalline diamond FETs. The dc characteristics of the FET showed a drain-current density I/sub DS/ of 550 mA/mm at gate-source voltage V/sub GS/ of -3.5 V and a maximum transconductance g/sub m/ of 143 mS/mm at drain voltage V/sub DS/ of -8 V. These results indicate that the high-quality polycrystalline diamond film, whose maximum size is 4 in at present, is a most promising substrate for diamond electronic devices.
Keywords :
CVD coatings; diamond; millimetre wave field effect transistors; -3.5 V; -8 V; 0.1 micron; 120 GHz; 4 in; 45 GHz; chemical vapor deposited films; diamond electronic devices; field effect transistors; oscillation maximum frequency; polycrystalline diamond film; transition frequency; Charge carrier processes; Chemical vapor deposition; Electron mobility; FETs; Grain boundaries; Power generation; Radio frequency; Substrates; Thermal conductivity; Voltage; Field effect transistor (FET); RF performance; hydrogen terminated; polycrystalline diamond;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2006.876325