DocumentCode :
985590
Title :
Thermal properties of power HBT´s
Author :
HigginS, J. Aiden
Author_Institution :
Sci. Center, Rockwell Int. Corp., Thousand Oaks, CA, USA
Volume :
40
Issue :
12
fYear :
1993
fDate :
12/1/1993 12:00:00 AM
Firstpage :
2171
Lastpage :
2177
Abstract :
Simulations of the thermal behavior of AlGaAs/GaAs HBT power transistors have been carried out to establish the quantitative tradeoff between power density, chip layout and junction temperatures. Numerical programs were used to model different aspects of HBT thermal behavior. These programs provide a dynamic solution for temperature distribution using a three-dimensional model which is very general in its ability to model composite chip cross sections. A model was developed to calculate threshold power densities for thermal instability. Standard and novel methods of controlling maximum temperatures in the devices are explored and evaluated. These methods include flip chip bonding and the use of partial vias. The prevention of thermal instability is described. The thermal time constants are found to have a fast component, on order of a few microseconds, and a slower component that depends on substrate thickness
Keywords :
III-V semiconductors; aluminium compounds; flip-chip devices; gallium arsenide; heterojunction bipolar transistors; power transistors; semiconductor device models; temperature distribution; thermal analysis; thermal resistance; AlGaAs-GaAs; AlGaAs/GaAs HBT power transistors; chip layout; composite chip cross sections; dynamic solution; emitter finger size effects; flip chip bonding; heat removal; junction temperature; maximum temperature control; numerical programs; partial vias; power HBT; power density; temperature distribution; thermal behavior simulation; thermal instability; thermal spreading resistance; thermal time constants; three-dimensional model; threshold power densities; Fingers; Gallium arsenide; Heterojunction bipolar transistors; Power transistors; Radio frequency; Temperature control; Temperature distribution; Thermal factors; Thermal resistance; Thermal stability;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.249461
Filename :
249461
Link To Document :
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