Microstructure and magnetic properties of ACD Co-P thin films for magnetic recording

Author

Bozzini, B. ; Cavallotti, P.L. ; Ivanov, M. ; Arras, L. ; Garbarino, S. ; Terrenzio, E. ; Visigalli, P.

Author_Institution

Dipartimento Fisica Appl., Politecnico, Milan, Italy

Volume

26

Issue

1

fYear

1990

fDate

1/1/1990 12:00:00 AM

Firstpage

45

Lastpage

47

Abstract

An electrochemical method, based on the measurement of transient voltages after short square current pulses, is proposed to control the chemical deposition of Co-P thin films for magnetic recording. By this method it has been possible to show the importance of H₂ or O ₂ saturation in the bath on the process, mainly at the nucleation stage. Co-P films of different structure are obtained from several solutions and, after different pretreatments, their role is stressed. The relations between the deposit structure and its magnetic properties are pointed out

Keywords

cobalt alloys; electrodeposition; electrodeposits; ferromagnetic properties of substances; magnetic properties of amorphous substances; magnetic recording; magnetic thin films; noncrystalline state structure; phosphorus alloys; Co-P film; H₂ saturation; O₂ saturation; amorphous films; autocatalytic chemical deposition; chemical deposition; deposit structure; deposition control; electrochemical method; magnetic properties; magnetic recording; magnetic thin films; microstructure; nucleation stage; short square current pulses; transient voltages; Chemical technology; Current measurement; Electrodes; Magnetic films; Magnetic properties; Magnetic recording; Microstructure; Pulse measurements; Substrates; Voltage;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.50485

Filename

50485