Effect of RF substrate bias on crystalline orientation of chromium and magnetic characteristics of 84% Co-16% Cr films

A report is presented on the conditions for the formation of Cr films with a (110) planar orientation on glass substrates as a function of 13.56-MHz RF substrate bias and sputtering pressure. The Cr (110) planar orientation is dependent on the RF bias voltage as well as on the argon pressure. The developed DC bias voltages from the applied RF substrate bias voltages were measured with respect to ground. At zero bias and at 3-mtorr pressure, Cr films exhibit a weak (110) planar crystalline orientation, but at 10-mtorr pressure they exhibit a random orientation and/or microcrystalline structure. Experimental results show that an optimum bias voltage (-150 V) and pressure (10 mtorr) occur for maximum Cr (110) planar orientation. Co₈₄Cr₁₆ (at.%) alloy films were evaluated relative to their crystalline orientation as a function of RF substrate bias and pressure. The magnetic properties of Co₈₄Cr₁₆ films at optimum bias and argon pressure were evaluated on Cr underlayers with maximum (110) planar orientation on glass substrates