• DocumentCode
    986491
  • Title

    Low-voltage discharge in cesium-hydrogen mixture as a source of negative hydrogen ions

  • Author

    Baksht, F.G. ; Djuzhev, Georgy A. ; Elizarov, L.I. ; Ivanov, Vasily G. ; Kostin, Anatoly A. ; Shkolnik, Sergey M.

  • Author_Institution
    A.F. Ioffe Phys.-Tech. Inst., Polytech., St. Petersburg, Russia
  • Volume
    21
  • Issue
    5
  • fYear
    1993
  • fDate
    10/1/1993 12:00:00 AM
  • Firstpage
    552
  • Lastpage
    559
  • Abstract
    It is shown theoretically that a low-voltage Cs-H2 discharge can be utilized as a volume-plasma negative hydrogen ion source with very high H- concentration (≲1013 cm-3) in plasma. The volume H- generation occurs because of dissociation attachment of heated thermal electrons to vibrationally excited H2 molecules. The high rate of H- generation is explained by high electron concentration (~1014 cm-3), high hydrogen pressure (≳1 torr) and optimum value of thermal electron temperature (≳1 eV) in plasma. It causes rapid pumping of vibrationally excited H2 levels and high rate of dissociative attachment. Electron vibration kinetics in the discharge is considered, and H- concentration is calculated. The optimum discharge parameters for H- generation are determined. Experimental investigation of the discharge has been performed. It is shown that theoretical and experimental plasma parameters are very close to one another
  • Keywords
    caesium; discharges (electric); electron attachment; hydrogen; hydrogen ions; ion sources; molecular electron impact dissociation; negative ions; plasma collision processes; plasma probes; 1 eV; 1 torr; Cs-H2; H2; H-; dissociation attachment; electron vibration kinetics; heated thermal electrons; ion source; low-voltage discharge; optimum discharge parameters; pumping; vibrationally excited molecules; Electrodes; Electrons; Fault location; Fusion power generation; Hydrogen; Ion sources; Plasma accelerators; Plasma materials processing; Plasma sources; Plasma temperature;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.249642
  • Filename
    249642