• DocumentCode
    987072
  • Title

    Improved RF Power Performance in a 0.18- \\mu\\hbox {m} MOSFET Which Uses an Asymmetric Drain Design

  • Author

    Chang, T. ; Kao, H.L. ; McAlister, S.P. ; Horng, K.Y. ; Chin, Albert

  • Author_Institution
    Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu
  • Volume
    29
  • Issue
    12
  • fYear
    2008
  • Firstpage
    1402
  • Lastpage
    1404
  • Abstract
    We have fabricated 0.18-mum asymmetric MOSFETs using a foundry-standard 1P6M process, without making any process modifications. In comparison with a conventional 0.18-mum MOSFET, the asymmetric MOSFET design leads to a 64% improvement in the saturated output power and 8 dB better adjacent channel power ratio. The improvement in the RF power performance of these MOS transistors suggests that they should be suitable for medium power amplifiers.
  • Keywords
    power MOSFET; power amplifiers; MOSFET; RF power performance; asymmetric drain design; foundry-standard 1P6M process; power amplifiers; size 0.18 mum; CMOS process; Cutoff frequency; Electrical resistance measurement; MOSFET circuits; Power MOSFET; Power amplifiers; Power generation; Radio frequency; Radiofrequency amplifiers; Semiconductor device measurement; Asymmetric; MOS; RF Power; lightly doped-drain (LDD);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2008.2007509
  • Filename
    4671138