Title :
Improved RF Power Performance in a 0.18-
MOSFET Which Uses an Asymmetric Drain Design
Author :
Chang, T. ; Kao, H.L. ; McAlister, S.P. ; Horng, K.Y. ; Chin, Albert
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu
Abstract :
We have fabricated 0.18-mum asymmetric MOSFETs using a foundry-standard 1P6M process, without making any process modifications. In comparison with a conventional 0.18-mum MOSFET, the asymmetric MOSFET design leads to a 64% improvement in the saturated output power and 8 dB better adjacent channel power ratio. The improvement in the RF power performance of these MOS transistors suggests that they should be suitable for medium power amplifiers.
Keywords :
power MOSFET; power amplifiers; MOSFET; RF power performance; asymmetric drain design; foundry-standard 1P6M process; power amplifiers; size 0.18 mum; CMOS process; Cutoff frequency; Electrical resistance measurement; MOSFET circuits; Power MOSFET; Power amplifiers; Power generation; Radio frequency; Radiofrequency amplifiers; Semiconductor device measurement; Asymmetric; MOS; RF Power; lightly doped-drain (LDD);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2008.2007509