• DocumentCode
    987160
  • Title

    High-bandwidth OEIC receivers using heterojunction bipolar transistors: Design and demonstration

  • Author

    Pedrotti, K.D. ; Pierson, R.L., Jr. ; Sheng, N.H. ; Nubling, R.B. ; Farley, C.W. ; Chang, M.F.

  • Author_Institution
    Rockwell Int. Corp., Thousand Oaks, CA, USA
  • Volume
    11
  • Issue
    10
  • fYear
    1993
  • fDate
    10/1/1993 12:00:00 AM
  • Firstpage
    1601
  • Lastpage
    1614
  • Abstract
    The design, fabrication, and performance of the highest speed optoelectronic integrated circuit (OEIC) receivers reported to date are presented. These consist of PIN detectors and AlGaAs/GaAs HBT transistors fabricated on the same GaAs substrate. The p-i-n detectors were made from the same base and collector epitaxial layers as used for the HBT transistors and were completely compatible with the authors´ usual transistor fabrication process; no process alteration was required. The authors report 20-mm detectors with 35.6% quantum efficiency, 40-nA dark current at -3-V bias, and bandwidth in excess of 17 GHz. These detectors were used to produce two OEIC receivers, one with a bandwidth of 6.7 GHz and an equivalent input noise current of 4.3 pA/Hz1/2 and another with a bandwidth of 13 GHz and an equivalent input noise current of 10 pA/Hz1/2. The performances of a variety of circuit topologies are compared, and the effect of different epitaxial layer structures on OEIC performance is investigated
  • Keywords
    bipolar integrated circuits; integrated optoelectronics; optical receivers; p-i-n photodiodes; photodetectors; 3 V; 35.6 percent; 40 nA; 6.7 GHz; AlGaAs-GaAs; AlGaAs/GaAs HBT transistors; GaAs substrate; HBT transistors; OEIC performance; PIN detectors; circuit topologies; collector epitaxial layers; dark current; design; epitaxial layer structures; equivalent input noise current; fabrication; heterojunction bipolar transistors; high-bandwidth OEIC receivers; optoelectronic integrated circuit; p-i-n detectors; quantum efficiency; transistor fabrication process; Bandwidth; Circuit noise; Detectors; Epitaxial layers; Gallium arsenide; Heterojunction bipolar transistors; High speed integrated circuits; Optical device fabrication; Optoelectronic devices; Substrates;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/50.249902
  • Filename
    249902