DocumentCode :
988000
Title :
Performance Comparison Between Metallic Carbon Nanotube and Copper Nano-Interconnects
Author :
Maffucci, Antonio ; Miano, Giovanni ; Villone, Fabio
Author_Institution :
DAEIMI, Univ. di Cassino, Cassino
Volume :
31
Issue :
4
fYear :
2008
Firstpage :
692
Lastpage :
699
Abstract :
This paper addresses the problem of scaling interconnects to nanometric dimensions in future very-large-scale integration applications. Traditional copper interconnects are compared to innovative interconnects made by bundles of metallic carbon nanotubes. A new model is presented to describe the propagation of electric signals along carbon nanotube (CNT) bundles, in the framework of the classical transmission line theory. A possible implementation of a future scaled microstrip based on CNT bundle is analyzed and compared to a conventional microstrip.
Keywords :
VLSI; carbon nanotubes; copper; integrated circuit interconnections; microstrip lines; nanoelectronics; C; CNT bundles; Cu; classical transmission line theory; copper nanointerconnects; electric signal propagation; metallic carbon nanotube; scaled microstrip; very-large-scale integration; Carbon nanotubes; Copper; Current density; Electrons; Fabrication; Microstrip; Scattering; Thermal conductivity; Transmission line theory; Very large scale integration; Interconnects; metallic carbon nanotubes; nano-technology;
fLanguage :
English
Journal_Title :
Advanced Packaging, IEEE Transactions on
Publisher :
ieee
ISSN :
1521-3323
Type :
jour
DOI :
10.1109/TADVP.2008.2005001
Filename :
4674529
Link To Document :
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