DocumentCode
988073
Title
High-Q electrostatic discharge (ESD) protection devices for use at radio frequency (RF) and broad-band I/O pins
Author
Joshi, Sopan ; Hyvonen, Sami ; Rosenbaum, Elyse
Author_Institution
Univ. of Illinois, Urbana-Champaign, IL, USA
Volume
52
Issue
7
fYear
2005
fDate
7/1/2005 12:00:00 AM
Firstpage
1484
Lastpage
1488
Abstract
Radio frequency and broad-band I/O circuit designers may compensate for the capacitance of electrostatic discharge (ESD) protection elements by designing them into tuned resonators or matched filters, thereby requiring that the protection device capacitance have a high quality factor (Q). In this paper, we explore several ESD protection device options, focusing on improvement in Q. We show that surrounding a grounded-gate nMOS transistor with a deep trench increases its Q, while adding a trigger circuit decreases it. We also show that SiGe diodes are preferred over SiGe n-p-n devices. A detailed analysis of experimental results is provided.
Keywords
Ge-Si alloys; MOSFET; Q-factor; capacitance; electrostatic discharge; radiofrequency integrated circuits; resonators; semiconductor device models; semiconductor diodes; trigger circuits; ESD protection device; SiGe; SiGe diode; SiGe n-p-n device; broad-band I/O circuit design; high-Q electrostatic discharge; nMOS transistor; protection device capacitance; quality factor; radio frequency; Capacitance; Electrostatic discharge; Germanium silicon alloys; Matched filters; Pins; Protection; Q factor; Radio frequency; Silicon germanium; Tuned circuits; Broadband integrated circuits; RF integrated circuits; electrostatic discharge protection; quality factor;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2005.850688
Filename
1459108
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